Space Plasma Simulation
Low Energy Plasma Source (LEPS 250)
The LEPS 250 system produces very low energy ions (< 20 eV) and very low energy electrons in a diffuse plasma plume. Plasma ion flux levels are variable from zero to tens of milliamperes. Producing negligible contaminants, the LEPS 250 system is ideally suited for ultra-clean vacuum processing and may be used with confidence to satisfy the most stringent substrate cleanliness requirements.
Applications include substrate component surface cleaning, energy addition during coating and deposition processes, precise substrate charge control, volume plasma generation for diagnostic functions, and space plasma environment simulation.
Systems are delivered as ready-to-operate packages. Mounting and interconnects are simple. Flexible orientation and small size permit installation in space-confined vacuum facilities. The LEPS 250 system is a complete package which includes operating power systems, vacuum feed-throughs and all in-vacuum and out-of-vacuum wiring and mounting connections for immediate customer use. The LEPS 250 system requires a clean gas feed system and 90-250 VAC at 50/60 Hz for operation.
|Ion energy:||10-20 eV|
|Electron energy:||< 1eV|
|Gas flow rate:||Minimum of 0.1 sccm (Xe)|
|Ion flux:||Up to 25 mA (Ar)|
Up to 12 mA (Xe)
|Electron flux:||Approximately 100x ion flux|
|Plume divergence:||Wide angle by design|